DEGRADATION OF SOME CHLOROPHENOLS BY COATED-TiO2 PHOTOREACTOR |
Oh-Jin Jung†, Hyung-Il Choi, and Kyung-Hoon Cheong |
School of Environmental Engineering, Chosun University, Gwang-ju 501-759, Korea |
Corresponding Author:
Oh-Jin Jung ,Tel: +82-62-230-6644, Fax: +82-62-234-6754, Email: ojjung@mail.chosun.ac.kr |
Received: June 17, 2001; Accepted: November 16, 2001. |
|
Share :
|
ABSTRACT |
Three coating procedures, such as CVD, Sol-Gel, and dipping method were used to prepare Ti02 thin films for degradation of hazardous organic compounds exemplified by chlorophenols. The coating process of Ti02 onto a quartz glass reactor surface was investigated for improvement of the photodegradation-efficiency. Results of 2-CP degradation followed the order: TiCh-thin film photoreactor by CVD/H2O2 > Ti02 by dipping/H202 > Ti02 by Sol-Gel/H202 > Ti02 by CVD/02 > H202-UV only > Ti02(suspension)/02 > direct UV. It was also observed that the coated TiO: reactor could be used to degrade chlorophenols at least up to 60 h without loss of photocatalytic activity. The degradation efficiency increased with decrease of the number of the chlorine atoms substituted on the phenolic ring. The rate of degradation for monochlorophenols was the following order: 2-CP > 4-CP > 3-CP. Also results of chlorophenols degradation followed the order: MCP > DCP >TCP. However, TOC measurements showed that the order of mineralization was the following order: TCP > DCP > MCP. |
Keywords:
chlorophenols | CVD | immobilization | photodegradation-efficiency | quartz glass tube | Sol-Gel |
|
|
|